Wuppertal, Germany

Lars Meier

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Delphi Technologies, Inc.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lars Meier. Retrieved from https://idiyas.com/inventor/lars-meier-i95jrnhb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Lars Meier - Innovator in Line Attachment Technology.

Introduction

Lars Meier is a notable inventor based in Wuppertal, Germany. He has made significant contributions to the field of line attachment technology. His innovative approach has led to the development of a unique device that enhances the safety and efficiency of attaching lines to connecting elements.

Latest Patents

Lars holds a patent for a "Device for attaching a line to a connecting element." This device features an upper and a lower die, each equipped with a press surface. A key aspect of this invention is the inclusion of at least one recess outside of the press surfaces. This design minimizes the risk of damage to the dies in the event of an erroneous attachment of the wire cable to the connecting element. Lars has 1 patent to his name.

Career Highlights

Lars Meier is currently employed at Delphi Technologies, Inc., where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of line attachment devices.

Collaborations

Lars collaborates with talented individuals such as Klaus Kaufmann and Christian Staab. Their combined expertise fosters a creative environment that drives innovation.

Conclusion

Lars Meier's contributions to line attachment technology exemplify his commitment to innovation and safety. His patent reflects a thoughtful approach to design, ensuring that his inventions meet the needs of the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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