Kilchberg, Switzerland

Lars Andersson

This inventor holds 3 USPTO granted patents, plus 1 CIPO patent and 4 EPO patents. Top assignee: Omya International Ag. Active years: 2017-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lars Andersson. Retrieved from https://idiyas.com/inventor/lars-andersson-n3lzckjf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0


 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2017-2022

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3 patents (USPTO):Explore Patents

Title: Lars Andersson: Innovator in Filler Particle Technology

Introduction

Lars Andersson is a notable inventor based in Kilchberg, Switzerland. He has made significant contributions to the field of filler particle technology, holding a total of 3 patents. His work focuses on innovative processes that enhance the preparation of flocculated filler particles.

Latest Patents

Among his latest patents is a process for the preparation of flocculated filler particles. This invention involves combining at least two aqueous suspensions of filler material and flocculating additives. This process aims to improve the efficiency and effectiveness of filler particle production.

Career Highlights

Lars Andersson is currently associated with Omya International AG, a leading company in the field of industrial minerals. His expertise in filler particle technology has positioned him as a key player in the industry, contributing to advancements that benefit various applications.

Collaborations

Lars has collaborated with notable colleagues such as Daniel Gantenbein and Patrick A C Gane. These partnerships have fostered innovation and have been instrumental in the development of new technologies in their field.

Conclusion

Lars Andersson's work in the preparation of flocculated filler particles showcases his innovative spirit and dedication to advancing technology. His contributions continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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