Pinnacle, NC, United States of America

Larry W Nelson

This inventor holds 1 USPTO granted patent. Top assignee: Surry Chemicals, Inc.. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Larry W Nelson. Retrieved from https://idiyas.com/inventor/larry-w-nelson-121vwp94

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1995

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations by Larry W. Nelson

Introduction

Larry W. Nelson is an accomplished inventor based in Pinnacle, NC (US). He has made significant contributions to the field of fabric technology, particularly in enhancing the durability of dyed materials. His innovative approach has led to the development of a unique process that addresses a common challenge in the textile industry.

Latest Patents

Larry W. Nelson holds a patent for a "Process for increasing the lightfastness of dyed fabrics." This process is designed to prepare dyed fabric materials with an increased lightfastness of at least 600 hours. The method involves immersing the dyed fabric in an aqueous solution of a cinnamate ester, followed by removing the fabric from the solution and drying it. This innovation is crucial for manufacturers seeking to improve the longevity of their dyed products.

Career Highlights

Larry is associated with Surry Chemicals, Inc., where he applies his expertise in chemical processes to develop solutions for the textile industry. His work has not only advanced the field but has also provided practical benefits to manufacturers and consumers alike.

Conclusion

Larry W. Nelson's contributions to the textile industry through his innovative patent demonstrate his commitment to enhancing product quality and durability. His work continues to influence the way dyed fabrics are treated and utilized in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…