Larry Stark

Title: Larry Stark: Innovator in Substrate Exposure Technologies

Introduction

Larry Stark is a notable inventor based in San Jose, California. He has made significant contributions to the field of substrate exposure technologies, particularly through his innovative patent. With a focus on improving the efficiency and effectiveness of substrate processing, Stark's work has implications for various industries.

Latest Patents

Larry Stark holds a patent titled "Systems and methods for exposing substrate periphery." This invention describes systems and methods for the exposure and removal of material on the periphery of a substrate. The system includes an emitting radiation or exposure source, preferably a guide such as an optical assembly and an emitter, an edge detector, a transport comprising rotating and radial mechanisms, and a substrate support. The optical assembly directs radiation from the exposure source to the wafer or emitter. The transport supports the emitter and the edge detector about the substrate, and a tracking exposure head preferably supports the emitter and edge detector. As the emitter moves along the periphery of the substrate, the edge detector sends signals to control systems, which process signals and command the transport to adjust the position of the emitter when necessary to expose the periphery of the substrate. In another embodiment, the system provides an exposure source chamber, a process chamber, and optionally a control chamber to isolate particle and thermal problems. In another embodiment, the wafer is in a rotating drum, which supports a radial mechanism, supporting a tracking exposure head holding the emitter and edge detector. The drum and tracking exposure head have guidance components and stopping mechanisms. Stark's innovative approach has led to advancements in substrate processing techniques.

Career Highlights

Throughout his career, Larry Stark has worked with prominent companies in the technology sector. Notably, he has been associated with ASML US, Inc. and ASML Holding N.V. His experience in these organizations has allowed him to develop and refine his expertise in substrate exposure technologies.

Collaborations

Larry Stark has collaborated with several professionals in his field, including Bryan Wade and Dikran S. Babikian. These collaborations have contributed to the advancement of technologies related to substrate processing.

Conclusion

Larry Stark is a distinguished inventor whose work in substrate exposure technologies has made a significant impact on the industry. His innovative patent and career achievements reflect his dedication to advancing technology in this field.