Company Filing History:
Years Active: 2012
Title: Larry Puechner: Innovator in Thermal Processing of Silicon Wafers
Introduction
Larry Puechner is a notable inventor based in Dallas, TX (US). He has made significant contributions to the field of thermal processing, particularly in the area of silicon wafers. His innovative approach has led to advancements that minimize surface defect development during the thermal processing of silicon wafers.
Latest Patents
Larry Puechner holds a patent for the "Thermal processing of silicon wafers." This invention encompasses apparatus and methods designed to minimize surface defect development in silicon wafers during thermal processing at relatively high temperatures. The technology is applicable to both horizontally-disposed and vertically-oriented furnaces, allowing for the thermal processing of larger wafers. The invention features a selectively-sealable process tube that encloses silicon wafers during heating. A heating atmosphere supply system induces a positive flow of a non-reactive process gas, such as hydrogen or argon, through the process tube. Additionally, an impurity sensor in the process tube outlet detects oxygen and moisture in the vented gas, ensuring the purity of the atmosphere surrounding the wafers during processing.
Career Highlights
Larry Puechner is currently employed at Maxim Integrated Products, Inc., where he continues to innovate in the field of semiconductor processing. His work has been instrumental in enhancing the efficiency and effectiveness of thermal processing techniques.
Collaborations
Larry has collaborated with notable colleagues, including Amit Subhash Kelkar and David E Billings, contributing to a dynamic and innovative work environment.
Conclusion
Larry Puechner's contributions to the thermal processing of silicon wafers exemplify his commitment to innovation in the semiconductor industry. His patented technology not only addresses critical challenges but also paves the way for future advancements in the field.