Grand Prairie, TX, United States of America

Larry G Venable

This inventor holds 4 USPTO granted patents. Top assignee: Texas Instruments Corporation. Active years: 1987-1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Larry G Venable. Retrieved from https://idiyas.com/inventor/larry-g-venable

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.2

ph-index = 3

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 1987-1992

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4 patents (USPTO):Explore Patents

Title: Larry G Venable: Innovator in Water Soluble Contrast Enhancement

Introduction

Larry G Venable is a notable inventor based in Grand Prairie, TX (US). He has made significant contributions to the field of photoresist patterning and developing. With a total of 4 patents to his name, Venable's work focuses on enhancing the quality and efficiency of various processes in technology.

Latest Patents

Venable's latest patents include a water soluble contrast enhancement composition and method of use. This innovative compound is designed to improve sidewall profiles in photoresist patterning and developing. The composition consists of a 1-oxy-2-diazonaphthalene sulfonamide salt, which plays a crucial role in enhancing the performance of photoresist materials.

Career Highlights

Larry G Venable is currently associated with Texas Instruments Corporation, where he continues to push the boundaries of innovation. His work has been instrumental in developing new methods and compositions that enhance technological processes.

Collaborations

Some of his notable coworkers include Peter Kim and Vic B Marriott. Their collaborative efforts contribute to the advancement of technology and innovation within their field.

Conclusion

Larry G Venable's contributions to the field of water soluble contrast enhancement demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in photoresist technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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