Shirley, MA, United States of America

Larry E Shephard

This inventor holds 1 USPTO granted patent. Top assignee: Uvtech Systems, Inc.. Active years: 2007.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: The Innovations of Larry E. Shephard

Introduction

Larry E. Shephard is a notable inventor based in Shirley, Massachusetts. He has made significant contributions to the field of plasma technology, particularly with his innovative designs and patents. His work has implications for various applications, including materials processing and semiconductor manufacturing.

Latest Patents

Larry E. Shephard holds a patent for a "Scanning Plasma Reactor." This invention features a scanning plasma reactor designed to excite reactant gases at a substrate surface. The reactor includes a beam forming module, a gas injection module, a reaction chamber with a window and a vacuum chuck, and a gas exhaust module. The radiation from the beam forming module, combined with the reactant gas, creates an excited plasma zone. This excited plasma zone can be translated across the substrate like a windshield wiper blade, or the substrate can be conveyed under a fixed gas reaction zone.

Career Highlights

Larry is associated with Uvtech Systems, Inc., where he continues to develop and refine his innovative technologies. His work at Uvtech Systems has positioned him as a key player in advancing plasma reactor technology.

Collaborations

Larry has collaborated with notable colleagues, including David J. Elliott and Kenneth J. Harte. Their combined expertise has contributed to the successful development of advanced technologies in their field.

Conclusion

Larry E. Shephard's contributions to the field of plasma technology through his innovative patent and collaborative efforts highlight his importance as an inventor. His work continues to influence advancements in various technological applications.

Profile summary based on public USPTO records.
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