This inventor holds 1 USPTO granted patent. Top assignee: Eaton Corporation. Active years: 1990.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1990
Title: Innovations of Larry E. Frisa
Introduction
Larry E. Frisa is a notable inventor based in Austin, TX, recognized for his contributions to the field of ion sources. He holds a patent for the SKM ion source, which showcases his innovative approach to enhancing beam purity and prolonging source life. His work is significant in advancing technologies that rely on ion sources.
Latest Patents
Larry E. Frisa's most recent patent is the SKM ion source. This invention features a side extraction type ion source that includes auxiliary electrodes surrounding the cathode at the ends of the anode. The design incorporates insulators that electrically isolate the auxiliary electrodes from the anode, thereby improving electrical isolation and enhancing the overall performance of the ion source. The unique structure of the insulators, which consists of inner and outer cylinders with radially extending flanges, contributes to the efficiency and longevity of the device.
Career Highlights
Larry E. Frisa is currently employed at Eaton Corporation, where he continues to innovate and develop technologies related to ion sources. His expertise and dedication to his work have made him a valuable asset to the company. With a patent count of 1 patent, he has made a significant impact in his field.
Collaborations
Throughout his career, Larry has collaborated with notable colleagues, including Monroe L. King and Stephen E. Sampayan. These partnerships have fostered an environment of innovation and creativity, leading to advancements in their respective fields.
Conclusion
Larry E. Frisa's contributions to the field of ion sources exemplify the spirit of innovation. His patented SKM ion source reflects his commitment to improving technology and enhancing performance in various applications. His work continues to influence the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
