This inventor holds 1 USPTO granted patent. Top assignee: The University of North Carolina at Chapel Hill. Active years: 2013.
Company Filing History:
Years Active: 2013
Title: Larkin E Euliss: Innovator in Micro- and Nano-Structures
Introduction
Larkin E Euliss is a prominent inventor based in Chapel Hill, NC (US). She has made significant contributions to the field of micro- and nano-structures through her innovative patent work. Her research focuses on advanced lithographic techniques that have the potential to revolutionize various applications in technology and materials science.
Latest Patents
Larkin E Euliss holds a patent titled "Methods for fabricating isolated micro- and nano-structures using soft or imprint lithography." This patent describes the use of fluorinated elastomer-based materials, particularly perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications. The disclosed methods enable the production of free-standing, isolated nanostructures of any shape, utilizing soft or imprint lithography techniques. This innovation is crucial for generating high-fidelity features using elastomeric molds, particularly in micro- and nanoscale replica molding.
Career Highlights
Larkin E Euliss is affiliated with the University of North Carolina at Chapel Hill, where she continues to advance her research in the field of nanotechnology. Her work has garnered attention for its potential applications in various industries, including electronics, materials science, and biotechnology. With her expertise, she contributes to the academic community and inspires future generations of scientists and engineers.
Collaborations
Larkin has collaborated with notable colleagues such as Joseph Desimone and Jason P Rolland. These partnerships have enhanced her research and expanded the impact of her innovations in the scientific community.
Conclusion
Larkin E Euliss is a trailblazer in the field of micro- and nano-structures, with a patent that showcases her innovative approach to lithography. Her work at the University of North Carolina at Chapel Hill continues to influence advancements in technology and materials science.