This inventor holds 1 USPTO granted patent. Top assignee: Novellus Systems Incorporated. Active years: 2001.
Company Filing History:
Years Active: 2001
Title: Innovations by Inventor Lap Tam
Introduction
Lap Tam is a notable inventor based in Fremont, CA (US). He has made significant contributions to the field of semiconductor processing. His innovative approach has led to the development of a unique method for cleansing vias in semiconductor wafers.
Latest Patents
Lap Tam holds a patent for a method of cleansing vias in semiconductor wafers that have a metal conductive layer. This patent addresses the removal of non-volatile and oxide residues that form during semiconductor processing. The process involves a two-stage method where an inert gas and a reducing gas are introduced to the reactor. In the first stage, non-volatile contaminants are sputtered from the semiconductor structure by creating a plasma to ionize the inert gas. The power applied to the plasma is high enough to give the ions of the inert gas a high degree of directionality as they approach the structure. The first stage continues until the non-volatile contaminants are sufficiently removed. In the second stage, the power is reduced, and the reducing gas, such as hydrogen, reacts with the oxides, like copper oxide, to form elemental metal and water vapor. This method limits damage to the structure compared to processes that use sputtering and reduction simultaneously.
Career Highlights
Lap Tam is currently employed at Novellus Systems Incorporated, where he continues to innovate in semiconductor technology. His work has been instrumental in advancing methods that enhance the efficiency and effectiveness of semiconductor processing.
Collaborations
Lap Tam has collaborated with notable colleagues, including Robert T Rozbicki and Ronald D Allen. Their combined expertise has contributed to the success of various projects within the semiconductor industry.
Conclusion
Lap Tam's innovative methods in semiconductor processing demonstrate his significant impact on the field. His patent for cleansing vias in semiconductor wafers showcases his dedication to improving technology. His contributions continue to influence advancements in semiconductor manufacturing.