Sichuan, China

Lanlan Li

This inventor holds 1 USPTO granted patent. Top assignees: Chinese Academy of Sciences, The Institute of Optics and Electronics. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lanlan Li. Retrieved from https://idiyas.com/inventor/lanlan-li-f6wddry8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Innovations of Lanlan Li in Focus Detection Technology

Introduction

Lanlan Li is a notable inventor based in Sichuan, China. He has made significant contributions to the field of projection lithography systems. His innovative work focuses on enhancing the precision and efficiency of focus detection apparatuses.

Latest Patents

Lanlan Li holds a patent for a "Focus Detection Apparatus for Projection Lithography System." This apparatus includes a laser, a focus optical unit, a force detection unit, a position detection unit, a differential amplifier, a Z-direction feedback control unit, and a scan signal generator. The design aims to achieve high precision, efficiency, and process applicability in focus detection.

Career Highlights

Throughout his career, Lanlan Li has worked with esteemed institutions such as the Chinese Academy of Sciences and the Institute of Optics and Electronics. His experience in these organizations has allowed him to develop and refine his innovative technologies.

Collaborations

Lanlan Li has collaborated with notable colleagues, including Lixin Zhao and Song Hu. Their combined expertise has contributed to advancements in optical technologies.

Conclusion

Lanlan Li's work in focus detection technology exemplifies the impact of innovation in the field of projection lithography. His contributions continue to influence advancements in precision optical systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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