Centennial, CO, United States of America

Lance O Hayne

This inventor holds 1 USPTO granted patent, plus 1 CIPO patent. Top assignee: Landmark Graphics Corporation. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lance O Hayne. Retrieved from https://idiyas.com/inventor/lance-o-hayne

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Lance O Hayne: Innovator in Seismic Velocity Modeling

Introduction

Lance O Hayne is a notable inventor based in Centennial, CO (US). He has made significant contributions to the field of seismic velocity modeling, showcasing his expertise through his innovative patent.

Latest Patents

Lance O Hayne holds a patent for "Methods and systems of incorporating pseudo-surface pick locations in seismic velocity models." This patent involves methods that refine a seismic velocity model by correlating a predicted log to a measured log. It includes creating a pseudo-surface pick location in a modeled subsurface horizon based on the correlation, modifying a portion of the seismic velocity model based on this location, recalculating the modeled subsurface horizon, and plotting the modified surface on a computer display. He has 1 patent to his name.

Career Highlights

Lance has been associated with Landmark Graphics Corporation, where he has applied his skills and knowledge in seismic modeling. His work has contributed to advancements in the industry, particularly in refining seismic data interpretation.

Collaborations

Lance O Hayne has collaborated with Richard J Langenwalter, further enhancing the innovative efforts within their field.

Conclusion

Lance O Hayne's contributions to seismic velocity modeling through his patent demonstrate his commitment to innovation and excellence in the field. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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