Hsinchu, Taiwan

Lan-Kai Yeh

This inventor holds 1 USPTO granted patent. Top assignee: Au Optronics Corporation. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lan-Kai Yeh. Retrieved from https://idiyas.com/inventor/lan-kai-yeh-n936gcn3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Innovations of Lan-Kai Yeh in Flexible Display Technology.

Introduction

Lan-Kai Yeh is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of flexible display technology. His innovative approach has led to the development of a unique method for fabricating flexible display devices.

Latest Patents

Lan-Kai Yeh holds a patent for a "Method of fabricating flexible display device." This method involves providing a flexible display panel with an uneven surface and forming at least one filling layer on that surface. The filling layer can consist of an organic filling layer polymerized by a precursor layer or an inorganic filling layer that includes a nanometer-scale carbon structure. This innovation enhances the functionality and durability of flexible displays.

Career Highlights

Lan-Kai Yeh is currently associated with AU Optronics Corporation, a leading company in the display technology sector. His work at AU Optronics has allowed him to push the boundaries of flexible display technology and contribute to advancements in the industry.

Collaborations

Some of his notable coworkers include Chih-Jen Yang and Chun-Jan Wang. Their collaborative efforts have further enriched the research and development environment at AU Optronics.

Conclusion

Lan-Kai Yeh's contributions to flexible display technology exemplify the innovative spirit of modern inventors. His patent and work at AU Optronics highlight the importance of advancements in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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