Hong Kong, China

Lam Kwok Fan

This inventor holds 1 USPTO granted patent. Top assignee: Techtronic Floor Care Technology Limited. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lam Kwok Fan. Retrieved from https://idiyas.com/inventor/lam-kwok-fan-jkufpc3w

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Lam Kwok Fan

Introduction

Lam Kwok Fan, an inventive force hailing from Hong Kong, is making waves in the realm of product development with his keen insights and innovative spirit. With a notable patent to his name, he is a valuable asset in the world of technological advancements.

Latest Patents

Lam holds a patent for a paper shredder, demonstrating his ability to enhance existing technologies and develop solutions that meet modern needs. This invention reflects his dedication to creating efficient and practical tools for everyday use.

Career Highlights

Currently, Lam is associated with Techtronic Floor Care Technology Limited, where he contributes to the development of cutting-edge products. His role in the company underlines his commitment to innovation in floor care technology and functional design.

Collaborations

During his career, Lam has had the pleasure of collaborating with talented coworkers, including Lau Hee Wing and Leon Kuo Liang Yoong. These partnerships not only enrich his work but also foster a collaborative environment that encourages creativity and progress in technology.

Conclusion

In conclusion, Lam Kwok Fan stands out as an inventor who is not only skilled in his craft but also committed to collaboration and innovation. His patent for a paper shredder is a testament to his ability to transform ideas into practical solutions, making a meaningful impact in the field of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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