Sunnyvale, CA, United States of America

Lakshmi Nittala

USPTO Granted Patents = 1 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 270(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Innovations by Lakshmi Nittala

Introduction

Lakshmi Nittala is an accomplished inventor based in Sunnyvale, CA. He has made significant contributions to the field of technology, particularly in the area of atomic layer removal processes. His innovative work has led to advancements that enhance efficiency and effectiveness in various applications.

Latest Patents

Lakshmi Nittala holds a patent for an "Atomic layer removal process with higher etch amount." This invention achieves a higher overall etch rate and throughput for atomic layer removal (ALR). The reaction is a self-limiting process, which limits the total amount of material that may be etched per cycle. By pumping down the process station between reacting operations, the reaction is partially 'reset.' A higher overall etch rate is achieved through a multiple exposure with the pump down ALR process. He has 1 patent to his name.

Career Highlights

Lakshmi Nittala is currently employed at Novellus Systems Incorporated, where he continues to innovate and contribute to the field. His work has been instrumental in developing processes that improve manufacturing techniques in the semiconductor industry.

Collaborations

Some of his notable coworkers include Nerissa Sue Draeger and Harald Te Nijenhuis. Their collaboration has fostered an environment of innovation and creativity, leading to advancements in their respective fields.

Conclusion

Lakshmi Nittala's contributions to the field of atomic layer removal processes exemplify the impact of innovative thinking in technology. His work not only enhances efficiency but also sets a foundation for future advancements in the industry.

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