Hudson, NH, United States of America

Lakshma Reddy Eapur

This inventor holds 3 USPTO granted patents. Top assignee: Paymentech, LLC. Active years: 2011-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lakshma Reddy Eapur. Retrieved from https://idiyas.com/inventor/lakshma-reddy-eapur

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2011-2020

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3 patents (USPTO):Explore Patents

Title: Innovations by Lakshma Reddy Eapur

Introduction

Lakshma Reddy Eapur is an accomplished inventor based in Hudson, NH (US). He has made significant contributions to the field of payment processing technology, holding a total of three patents. His work focuses on enhancing the efficiency and security of merchant payment data management.

Latest Patents

One of Lakshma Reddy Eapur's latest patents is titled "System and method for updating merchant payment data." This innovative system provides a solution for updating merchant on-file payment data at a payment processor. The system includes a merchant processing selection system that receives selection data for one of two or more types of on-file payment data update processing. Additionally, a merchant account update system receives the selection data and processes account update data based on the selection data. This patent exemplifies his commitment to improving payment processing systems.

Career Highlights

Lakshma Reddy Eapur is currently employed at Paymentech, LLC, where he continues to develop cutting-edge solutions in the payment processing industry. His expertise and innovative mindset have positioned him as a valuable asset to the company.

Collaborations

Throughout his career, Lakshma has collaborated with talented professionals, including coworkers Tonya Lin Carroll and Chantal Adair Gaspie. These collaborations have fostered a creative environment that encourages the development of new ideas and technologies.

Conclusion

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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