Kyungyeon Hwang

Title: Kyungyeon Hwang: Innovator in Semiconductor Technology

Introduction

Kyungyeon Hwang is a notable inventor based in Yongin-si, South Korea. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.

Latest Patents

Hwang holds a patent for a semiconductor device and method of fabricating the same. This semiconductor device includes a substrate with an active pattern, a channel pattern featuring semiconductor patterns, and a source/drain pattern connected to these semiconductor patterns. Additionally, it incorporates a gate electrode and a gate dielectric layer positioned between the gate electrode and the semiconductor patterns. The design features an inner spacer of the gate dielectric layer, which consists of a horizontal portion, a vertical portion, and a corner portion, each with varying thicknesses to enhance performance. Hwang's patent is a testament to his expertise and innovation in semiconductor design, with a total of 1 patent to his name.

Career Highlights

Kyungyeon Hwang is currently employed at Samsung Electronics Co., Ltd., a leading global technology company. His work at Samsung has allowed him to be at the forefront of semiconductor research and development, contributing to advancements in electronic devices.

Collaborations

Hwang collaborates with Hyun-Kwan Yu, a fellow innovator in the field. Their partnership exemplifies the collaborative spirit often found in technological advancements, particularly in the semiconductor industry.

Conclusion

Kyungyeon Hwang's contributions to semiconductor technology through his innovative patent highlight his role as a key inventor in the field. His work at Samsung Electronics Co., Ltd. and collaboration with peers further emphasize the importance of teamwork in driving technological progress.