Seongnam, South Korea

Kyungyeol Kim

This inventor holds 3 USPTO granted patents and 4 published patent applications. Top assignees: Oci Company Ltd., Sungkyunkwan University. Active years: 2024-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kyungyeol Kim. Retrieved from https://idiyas.com/inventor/kyungyeol-kim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 100.0

Average Co-Inventor Count = 5.1

ph-index = 1


Company Filing History:


Years Active: 2024-2026

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3 patents (USPTO):Explore Patents

Title: Innovations of Kyungyeol Kim in Fumed Silica Technology.

Introduction

Kyungyeol Kim is a notable inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of material science, particularly in the area of fumed silica. His innovative methods have the potential to enhance the efficiency of silica processing.

Latest Patents

Kyungyeol Kim holds a patent titled "Method for separating and collecting single aggregate from fumed silica and method for classifying shape of single aggregate." This invention relates to a method for separating and collecting single aggregates from fumed silica. It includes preparing a slurry in which fumed silica is dispersed in water, aerosolizing the slurry, and collecting single aggregates of the fumed silica in the aerosol using an electric field. He has 1 patent to his name.

Career Highlights

Kyungyeol Kim is currently employed at OCI Company Ltd., where he continues to develop innovative solutions in material science. His work has garnered attention for its practical applications in various industries.

Collaborations

He collaborates with talented individuals such as Younghun Park and Eungchul Kim, contributing to a dynamic research environment.

Conclusion

Kyungyeol Kim's contributions to the field of fumed silica technology exemplify the impact of innovative thinking in material science. His work not only advances the understanding of silica processing but also paves the way for future developments in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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