Suwon-si, South Korea

Kyung-Won Kang

USPTO Granted Patents = 4 

Average Co-Inventor Count = 4.5

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2010-2025

Loading Chart...
4 patents (USPTO):Explore Patents

Title: Kyung-Won Kang: Innovator in Semiconductor Technology

Introduction

Kyung-Won Kang is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving substrate processing methods, which are crucial for the fabrication of semiconductor devices.

Latest Patents

One of his latest patents is a substrate processing apparatus and method of fabricating semiconductor devices using the same. This innovative apparatus includes a photoresist coater that applies a photoresist film on a substrate. It also features a humidifier that increases the amount of moisture in the ambient environment to which the photoresist film is exposed. Additionally, an exposer irradiates the photoresist film, which has been exposed to the moisture-rich ambient, with light. The humidifier is strategically placed between the photoresist coater and the exposer, enhancing the overall efficiency of the process.

Career Highlights

Kyung-Won Kang has worked with prominent companies in the technology sector, including Samsung Electronics Co., Ltd. and Samsung SDI Co., Inc. His experience in these leading organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Throughout his career, Kyung-Won has collaborated with talented individuals such as Seok Heo and Cha Won Koh. These partnerships have fostered an environment of innovation and creativity, leading to the development of advanced technologies in the semiconductor field.

Conclusion

Kyung-Won Kang's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of efficient substrate processing methods, paving the way for future advancements in semiconductor devices.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…