Jeonju, South Korea

Kyung-Jun Ko

This inventor holds 1 USPTO granted patent. Top assignee: Dongwoo Fine-Chem Co., Ltd.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kyung-Jun Ko. Retrieved from https://idiyas.com/inventor/kyung-jun-ko

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: The Innovations of Kyung-Jun Ko

Introduction

Kyung-Jun Ko is a notable inventor based in Jeonju, South Korea. He has made significant contributions to the field of materials science, particularly in the development of resist stripping compositions. His work is essential for the manufacturing processes of flat panel display substrates.

Latest Patents

Kyung-Jun Ko holds a patent for a "Resist stripping composition and method of stripping resist using the same." This invention provides an excellent ability to strip residual resist that remains after dry or wet etching during the pattern formation process in flat panel display manufacturing. The innovation is crucial for enhancing the efficiency and quality of display production.

Career Highlights

Ko is currently employed at Dongwoo Fine-Chem Co., Ltd., where he continues to advance his research and development efforts. His work at the company has positioned him as a key player in the field of chemical engineering and materials science.

Collaborations

Some of his notable coworkers include Jeong-Hyun Kim and Yu-Jin Lee. Their collaborative efforts contribute to the innovative environment at Dongwoo Fine-Chem Co., Ltd.

Conclusion

Kyung-Jun Ko's contributions to the field of resist stripping compositions highlight his role as an influential inventor in the technology sector. His patent and ongoing work continue to impact the manufacturing processes of flat panel displays significantly.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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