Kyung Il Hong

Title: Kyung Il Hong: Innovator in Atomic Layer Deposition Technology

Introduction

Kyung Il Hong is a notable inventor based in Chungchungnam-do, South Korea. He has made significant contributions to the field of atomic layer deposition (ALD) technology. With a total of 2 patents to his name, his work focuses on enhancing the efficiency and productivity of ALD apparatuses.

Latest Patents

One of Kyung Il Hong's latest patents is an atomic layer deposition apparatus designed for rapidly depositing thin films on substrates larger than traditional planar substrates. This innovative ALD apparatus features a reaction chamber that optimizes gas supply by adjusting the flow based on the specific needs of different areas within the chamber. This design minimizes the time required for supplying reactant gases and reduces waste, ultimately increasing the productivity of the ALD process. The ceiling of the reaction space is uniquely shaped to create a nonuniform gap over the substrate, further enhancing the deposition process.

Career Highlights

Kyung Il Hong is currently employed at Asm Genitech Korea Ltd., where he continues to develop advanced technologies in the field of atomic layer deposition. His expertise and innovative approach have positioned him as a key player in the industry.

Collaborations

Some of his notable coworkers include Dae Youn Kim and Hyung-Sang Park, who contribute to the collaborative efforts in advancing ALD technology.

Conclusion

Kyung Il Hong's contributions to atomic layer deposition technology reflect his commitment to innovation and efficiency in the field. His patents demonstrate a forward-thinking approach that is likely to influence future developments in thin film deposition.