Company Filing History:
Years Active: 2008
Title: Kyuhwan Chang: Innovator in Thin Film Technology
Introduction
Kyuhwan Chang is a notable inventor based in State College, PA (US). He has made significant contributions to the field of materials science, particularly in the development of deposited thin films. His innovative work focuses on applications that utilize large surface to volume ratio materials for various purposes.
Latest Patents
Kyuhwan Chang holds 1 patent for his invention titled "Deposited thin films and their use in separation and sacrificial layer applications." This invention outlines a novel approach that employs large surface to volume ratio materials for separation, release layer, and sacrificial material applications. The patent details the material concept, application designs, and fabrication methodologies. It demonstrates the use of deposited column/void network materials as examples of these large surface to volume ratio materials. The invention shows that creating structures on a laminate on a mother substrate and subsequently separating this laminate using the present separation scheme is advantageous. Additionally, the materials exhibit excellent release layer utility, allowing for the unique formation of cavities, channels, air-gaps, and related structures in or on various substrates.
Career Highlights
Kyuhwan Chang is affiliated with the Penn State Research Foundation, where he continues to advance his research and innovations in materials science. His work has garnered attention for its practical applications and potential impact on various industries.
Collaborations
Some of his notable coworkers include Stephen J Fonash and Wook Jun Nam, who have collaborated with him on various projects and research initiatives.
Conclusion
Kyuhwan Chang's contributions to the field of thin film technology exemplify the innovative spirit of modern inventors. His work not only advances scientific understanding but also paves the way for practical applications in various sectors.