The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2008
Filed:
Apr. 17, 2001
Stephen J. Fonash, State College, PA (US);
Wook Jun Nam, State College, PA (US);
Youngchul Lee, State College, PA (US);
Kyuhwan Chang, State College, PA (US);
Daniel J. Hayes, State College, PA (US);
A. Kaan Kalkan, State College, PA (US);
Sanghoon Bae, Cupertino, CA (US);
Stephen J. Fonash, State College, PA (US);
Wook Jun Nam, State College, PA (US);
Youngchul Lee, State College, PA (US);
Kyuhwan Chang, State College, PA (US);
Daniel J. Hayes, State College, PA (US);
A. Kaan Kalkan, State College, PA (US);
Sanghoon Bae, Cupertino, CA (US);
The Penn State Research Foundation, University Park, PA (US);
Abstract
This invention uses large surface to volume ratio materials for separation, release layer, and sacrificial material applications. The invention outlines the material concept, application designs, and fabrication methodologies. The invention is demonstrated using deposited column/void network materials as examples of large surface to volume ratio materials. In a number of the specific applications discussed, it is shown that it is advantageous to create structures on a laminate on a mother substrate and then, using the separation layer material approach, to separate this laminate from the mother substrate using the present separation scheme. It is also shown that the present materials have excellent release layer utility. In a number of applications it is also shown how the approach can be used to uniquely form cavities, channels, air-gaps, and related structures in or on various substrates. Further, it is demonstrated that it also can be possible and advantageous to combine the schemes for cavity formation with the scheme for laminate separation.