Ueda, Japan

Kyu-oh Kim

This inventor holds 1 USPTO granted patent. Top assignees: Shinshu University, Toptec Company Limited. Active years: 2015.


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Kyu-oh Kim: Innovator in Separator Technology

Introduction

Kyu-oh Kim is a notable inventor based in Ueda, Japan. He has made significant contributions to the field of separator technology, particularly in the development of advanced materials for various applications.

Latest Patents

Kyu-oh Kim holds a patent for a separator and a method for manufacturing the separator. The invention provides a separator that includes a first nanofiber layer, which has a lattice shape when viewed from a plan perspective. Additionally, it features a second nanofiber layer on the first surface of the first layer, which is thinner, and a third nanofiber layer on the second surface, also thinner than the first layer. The thickness of the first nanofiber layer ranges from 7 µm to 30 µm, while the thickness of each of the second and third nanofiber layers ranges from 1 µm to 5 µm. This invention offers high insulation, high dendrite resistance, high ion conductivity, and high mechanical strength.

Career Highlights

Throughout his career, Kyu-oh Kim has worked with reputable organizations, including Toptec Company Limited and Shinshu University. His experience in these institutions has contributed to his expertise in separator technology and materials science.

Collaborations

Kyu-oh Kim has collaborated with notable colleagues, including Ick-soo Kim and Byoung-Suhk Kim. Their joint efforts have further advanced the research and development in their respective fields.

Conclusion

Kyu-oh Kim's innovative work in separator technology exemplifies the importance of advancements in materials science. His contributions continue to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
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