Company Filing History:
1 out of 131,611 
1 out of 38 Years Active: 2020
Title: Kyu-min Oh: Innovator in Chemical Mechanical Polishing
Introduction
Kyu-min Oh is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of chemical mechanical polishing (CMP), which is essential in semiconductor manufacturing. His innovative approach has led to the development of a unique method that enhances the efficiency of polishing processes.
Latest Patents
Kyu-min Oh holds a patent titled "Preparing conditioning disk for chemical mechanical polishing and chemical mechanical polishing method including the same." This patent describes a CMP method that involves preparing a polishing pad, determining specific loads and indentation depths for a conditioning disk, and conditioning the surface of the polishing pad effectively. His invention aims to improve the performance and reliability of CMP processes.
Career Highlights
Throughout his career, Kyu-min Oh has worked with prominent companies in the industry. He has been associated with Samsung Electronics Co., Ltd. and Ehwa Diamond Industrial Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in CMP technology.
Collaborations
Kyu-min Oh has collaborated with several talented individuals in his field. Notable coworkers include Myung-ki Hong and Yung-jun Kim, who have worked alongside him on various projects related to CMP.
Conclusion
Kyu-min Oh's contributions to the field of chemical mechanical polishing demonstrate his innovative spirit and dedication to advancing technology. His patent and career achievements reflect his expertise and commitment to improving manufacturing processes.