Kyu-Bin Han

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kyu-Bin Han. Retrieved from https://idiyas.com/inventor/kyu-bin-han-vtjux8ui

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Kyu-Bin Han: Innovator in Optical Proximity Correction

Introduction

Kyu-Bin Han is a notable inventor recognized for his contributions to the field of optical proximity correction. He is currently associated with Samsung Electronics Ltd., a leading technology company known for its innovative products and solutions. With a focus on enhancing photomask fabrication methods, Han has made significant strides in the industry.

Latest Patents

Kyu-Bin Han holds a patent for an "Optical Proximity Correction Method and Photomask Fabrication Method Using the Same." This invention aims to improve the accuracy and efficiency of photomask production, which is crucial for semiconductor manufacturing. His innovative approach has the potential to enhance the performance of various electronic devices.

Career Highlights

Throughout his career, Han has demonstrated a commitment to advancing technology through his inventive work. His patent reflects his expertise and dedication to solving complex challenges in the semiconductor industry. With a total of 1 patent, he has established himself as a valuable contributor to his field.

Collaborations

Kyu-Bin Han has collaborated with talented individuals such as Heungsuk Oh and Joobyoung Kim. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Kyu-Bin Han's work in optical proximity correction exemplifies the impact of innovation in the technology sector. His contributions continue to shape the future of semiconductor manufacturing, highlighting the importance of inventive minds in driving progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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