Kyoung Sub Shin

Title: Kyoung Sub Shin: Innovator in Semiconductor Technology

Introduction

Kyoung Sub Shin is a prominent inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on innovative designs that enhance the performance and efficiency of semiconductor devices.

Latest Patents

Kyoung Sub Shin's latest patents include groundbreaking advancements in semiconductor devices. One of his patents describes a semiconductor device that features gate stacks disposed on a substrate, spaced apart in a first direction, with a separation region interposed between the gate stacks. This design includes channel regions that penetrate through the gate stacks and a guide region that has a bent portion directed toward the separation region. Another patent details semiconductor devices with gate stack portions that extend in a zigzag pattern. This design incorporates a substrate with an upper surface extended in two perpendicular directions, featuring gate stack portions that include gate electrodes arranged in a zigzag form, enhancing the overall functionality of the device.

Career Highlights

Kyoung Sub Shin is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to push the boundaries of semiconductor technology, contributing to the company's reputation for innovation and excellence.

Collaborations

Throughout his career, Kyoung Sub Shin has collaborated with talented individuals such as Hyuk Kim and Sang Wuk Park. These collaborations have fostered a creative environment that has led to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Kyoung Sub Shin is a notable inventor whose work in semiconductor technology has resulted in significant advancements. His patents reflect a commitment to innovation and excellence in the industry.