This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2018.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2018
Title: Kyoung Sil Park: Innovator in Semiconductor Manufacturing
Introduction
Kyoung Sil Park is a prominent inventor based in Seongnam, South Korea. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent.
Latest Patents
Kyoung Sil Park holds a patent for a hard mask composition, carbon nanotube layer structure, pattern forming method, and manufacturing method of a semiconductor device. This patent describes a manufacturing method that includes forming a hard mask layer on a semiconductor substrate using a hard mask composition. The process involves creating hard mask patterns by patterning the hard mask layer and subsequently forming semiconductor patterns by etching the semiconductor substrate using these hard mask patterns. The hard mask composition consists of a plurality of first carbon nanotubes (CNTs) with a specific length and a plurality of second CNTs that are at least three times longer. Additionally, a dispersing agent is used to disperse both types of CNTs, with the total mass of the first CNTs being 1 to 2.5 times that of the second CNTs. This innovative approach enhances the efficiency and effectiveness of semiconductor device manufacturing.
Career Highlights
Kyoung Sil Park is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to focus on advancing semiconductor technologies and contributing to the company's innovative projects.
Collaborations
Throughout his career, Kyoung Sil Park has collaborated with notable colleagues, including Seung Yun Yang and Seung Hyun Lee. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies in the semiconductor field.
Conclusion
Kyoung Sil Park is a distinguished inventor whose work in semiconductor manufacturing has led to significant advancements in the industry. His innovative patent demonstrates his commitment to enhancing technology and improving manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
