Pohang, South Korea

Kyoung Hak Jung

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignees: Pohang University of Science and Technology Foundation, Samsung Electronics Co., Ltd.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kyoung Hak Jung. Retrieved from https://idiyas.com/inventor/kyoung-hak-jung

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Kyoung Hak Jung: A Profile of Innovation and Collaboration

Introduction

Kyoung Hak Jung is a notable inventor based in Pohang-si, Gyeongsangbuk-do, South Korea. He has made significant contributions to the field of technology, particularly through his work with prominent companies. Although he currently holds no patents, his experience and collaborations have shaped his career.

Latest Patents

As of now, Kyoung Hak Jung has not registered any patents. This may reflect his focus on collaborative projects and contributions to research rather than individual patent filings.

Career Highlights

Kyoung Hak Jung has worked with Samsung Electronics Co., Ltd., a leading global technology company. His role there has allowed him to engage in innovative projects that push the boundaries of technology. Additionally, he has been associated with the Postech Academy-Industry Foundation, where he has contributed to bridging the gap between academia and industry.

Collaborations

Kyoung Hak Jung has collaborated with various professionals in his field. One notable coworker is Chae Gwon Lim, with whom he has likely shared insights and worked on projects that advance their mutual interests in technology and innovation.

Conclusion

Kyoung Hak Jung's career reflects a commitment to innovation and collaboration within the technology sector. His experiences with leading companies highlight his potential impact on future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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