Tokyo, Japan

Kyosuke Iiizumi

This inventor holds 1 USPTO granted patent. Top assignee: Hoya Corporation. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kyosuke Iiizumi. Retrieved from https://idiyas.com/inventor/kyosuke-iiizumi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Kyosuke Iiizumi: Innovator in Magnetic Disk Technology

Introduction

Kyosuke Iiizumi is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of magnetic disk technology. His innovative approach has led to advancements in the manufacturing processes of glass substrates used in magnetic disks.

Latest Patents

Kyosuke Iiizumi holds a patent for a method of manufacturing a glass substrate for a magnetic disk. This patent outlines a cleaning step that involves cleaning the glass substrate under acidic conditions using a cleaning liquid containing oxalate ions and bivalent iron ions. Additionally, the method includes a process where trivalent iron ions generated by the oxidation of bivalent iron ions are reduced by ultraviolet irradiation, either in parallel with or before or after the cleaning step.

Career Highlights

Kyosuke Iiizumi is associated with Hoya Corporation, a leading company in optical products and solutions. His work at Hoya has allowed him to focus on innovative manufacturing techniques that enhance the quality and performance of magnetic disks.

Collaborations

One of his notable coworkers is Tomoyuki Yamaguchi, with whom he has collaborated on various projects related to magnetic disk technology.

Conclusion

Kyosuke Iiizumi's contributions to the field of magnetic disk technology through his innovative patent demonstrate his expertise and commitment to advancing manufacturing processes. His work continues to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…