Cambridge, MA, United States of America

Kyoo-Chul Pasrk

This inventor holds 1 USPTO granted patent. Top assignee: Xerox Corporation. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kyoo-Chul Pasrk. Retrieved from https://idiyas.com/inventor/kyoo-chul-pasrk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Kyoo-Chul Park: Innovator in Ink Jet Technology

Introduction

Kyoo-Chul Park is a notable inventor based in Cambridge, MA (US). He has made significant contributions to the field of ink jet technology, particularly through his innovative patent that addresses common issues faced in the industry.

Latest Patents

Kyoo-Chul Park holds a patent for a "Method for making an ink jet print head front face having a textured superoleophobic surface." This invention provides a solution to prevent undesirable drooling, wetting, and adhesion of ink on the print head. The textured surface includes a rim formed around the nozzle, enhancing the functionality of ink jet print heads. The methods described involve forming the textured superoleophobic surface from silicon, which is crucial for improving print quality.

Career Highlights

Kyoo-Chul Park is associated with Xerox Corporation, a leading company in the field of printing and imaging technology. His work at Xerox has allowed him to focus on developing advanced solutions that enhance the performance of ink jet systems.

Collaborations

Throughout his career, Kyoo-Chul Park has collaborated with talented individuals such as Hong Zhao and Kock-Yee Law. These collaborations have contributed to the advancement of technology in the printing industry.

Conclusion

Kyoo-Chul Park's innovative work in developing a superoleophobic surface for ink jet print heads showcases his commitment to improving printing technology. His contributions are significant in addressing challenges faced by the industry, and his patent reflects his expertise and dedication to innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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