Saitama, Japan

Kyoichi Hishikawa

This inventor holds 1 USPTO granted patent. Top assignee: Obayashi Corporation. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kyoichi Hishikawa. Retrieved from https://idiyas.com/inventor/kyoichi-hishikawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Kyoichi Hishikawa: Innovator in Construction Technology

Introduction

Kyoichi Hishikawa is a notable inventor based in Saitama, Japan. He has made significant contributions to the field of construction technology. His innovative approach has led to the development of a unique patent that addresses specific challenges in the industry.

Latest Patents

Hishikawa holds a patent for a temporary frame system for construction. This invention is designed to enhance the efficiency and safety of construction projects. It reflects his commitment to improving construction methodologies through innovative solutions. He has 1 patent to his name.

Career Highlights

Hishikawa is currently employed at Obayashi Corporation, a leading construction firm in Japan. His work at the company has allowed him to apply his inventive ideas in real-world projects. His contributions have been instrumental in advancing the company's technological capabilities.

Collaborations

Throughout his career, Hishikawa has collaborated with talented individuals such as Tatsuya Wakisaka and Noriyuki Furuya. These partnerships have fostered a creative environment that encourages innovation and problem-solving in construction.

Conclusion

Kyoichi Hishikawa is a prominent figure in the construction industry, known for his innovative patent and contributions to Obayashi Corporation. His work exemplifies the importance of creativity and collaboration in driving advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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