Kyoto, Japan

Kyohei Nakanishi

This inventor holds 1 USPTO granted patent. Top assignee: Screen Holdings Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kyohei Nakanishi. Retrieved from https://idiyas.com/inventor/kyohei-nakanishi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Kyohei Nakanishi: Innovator in Substrate Processing Technology

Introduction

Kyohei Nakanishi is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing, particularly in methods that enhance the efficiency and accuracy of film thickness monitoring.

Latest Patents

Nakanishi holds a patent for a substrate processing method that includes thickness monitoring. This innovative method involves a substrate with multiple chip regions designed for power devices, which is covered with a to-be-processed film. The thickness profile of this film is measured in the radial direction while the substrate rotates, allowing for precise calculations of average thickness. The method identifies candidate positions for measurement and monitors the thickness changes over time, ensuring optimal processing conditions.

Career Highlights

Kyohei Nakanishi is associated with Screen Holdings Co., Ltd., a company known for its advancements in semiconductor manufacturing technology. His work has contributed to the development of more efficient processing techniques that are crucial in the production of electronic devices.

Collaborations

Nakanishi collaborates with talented colleagues such as Taiki Hinode and Takashi Ota. Their combined expertise fosters an environment of innovation and progress within their field.

Conclusion

Kyohei Nakanishi's contributions to substrate processing technology exemplify the impact of innovative thinking in the semiconductor industry. His patent reflects a commitment to enhancing manufacturing processes, which is vital for the advancement of electronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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