Suwon, South Korea

Kyobum Keum

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kyobum Keum. Retrieved from https://idiyas.com/inventor/kyobum-keum

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations by Kyobum Keum

Introduction

Kyobum Keum is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of wearable technology. His innovative approach has led to the development of a unique method for controlling wearable devices.

Latest Patents

Kyobum Keum holds 1 patent for a method of determining the value of parameters for controlling wearable devices. This patent describes an electronic device that can receive log information regarding the motion of a wearable device. It determines values for mobile parameters that are applied to a robot parameter algorithm. This algorithm calculates a value of a robot parameter used to control the wearable device based on the received log information.

Career Highlights

Kyobum Keum is currently employed at Samsung Electronics Ltd., a leading company in the technology sector. His work focuses on enhancing the functionality and user experience of wearable devices. His innovative contributions have positioned him as a key player in the development of advanced electronic solutions.

Collaborations

Kyobum has collaborated with talented individuals such as Jungsik Hwang and Sungcheol Kim. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Kyobum Keum's work exemplifies the spirit of innovation in the field of wearable technology. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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