Princeton Junction, NJ, United States of America

Kyle Houck

This inventor holds 1 USPTO granted patent. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kyle Houck. Retrieved from https://idiyas.com/inventor/kyle-houck

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 15.0

ph-index = 1


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Innovations by Kyle Houck

Introduction

Kyle Houck is an inventive mind based in Princeton Junction, NJ (US). She has made significant contributions to the field of footwear technology. Her innovative approach has led to the development of a unique patent that enhances the functionality of footwear laces.

Latest Patents

One of her notable patents is the "Tension maintaining system for footwear laces." This invention features a clamp that includes a cap, a base, a plurality of staggered protrusions on both the base and the cap, a hinge, and a latch. The hinge is defined by the cap and the base, while the latch is designed to secure the cap to the base. This system allows for effective clamping of at least two laces on footwear, ensuring that they remain securely fastened during use. Kyle holds 1 patent for this innovative design.

Career Highlights

Throughout her career, Kyle has demonstrated a commitment to innovation and problem-solving. Her work in the footwear industry showcases her ability to identify challenges and create effective solutions.

Collaborations

Kyle has collaborated with talented individuals such as Brent Smedley and Shmuley Reitman. These partnerships have contributed to her success and the advancement of her inventions.

Conclusion

Kyle Houck is a remarkable inventor whose contributions to footwear technology are noteworthy. Her patent for a tension maintaining system exemplifies her innovative spirit and dedication to enhancing everyday products.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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