Kyeong-Koo Chi

Title: Kyeong-Koo Chi and Semiconductor Etch Innovation.

Introduction

Kyeong-Koo Chi is an inventor based in San Jose, California, whose work focuses on semiconductor etching processes. Chi is associated with Lam Research Corporation and is credited with 7 patents.

Latest Patents

Chi’s latest patent work includes methods for improving control during high-aspect-ratio etching.

“Sulfur and Fluorine Containing Etch Chemistry for Improvement of Distortion and Bow Control for HAR Etch” describes etching features through alternating layers in a stack above a substrate. The method uses a plasma formed from an etching gas containing specified sulfur-, fluorine-, carbon-, and hydrogen-based molecules. Its aim is to improve distortion and bow control during the etching process.

“Ultra-High Aspect Ratio Dielectric Etch” presents a method for etching a high-aspect-ratio feature in a dielectric layer through a carbon-based mask. The process alternates selective dielectric etching with selective removal of fluorocarbon polymer deposited on the mask, while preserving the mask for subsequent etching.

Career Highlights

Chi’s listed inventions address challenges in fabricating semiconductor structures with deep, narrow features. The disclosed techniques use tailored plasma chemistry and controlled polymer deposition and removal to support precision etching through layered materials.

Collaborations

Chi’s listed coworkers include Erik A. Edelberg and Jonathan Sungehul Kim. The patent information provided identifies Lam Research Corporation as Chi’s company.

Conclusion

Kyeong-Koo Chi’s patent portfolio reflects work on advanced semiconductor etching, with methods designed to improve process control and enable high-aspect-ratio feature fabrication.