Suwon, South Korea

Kwonchul Yoon

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kwonchul Yoon. Retrieved from https://idiyas.com/inventor/kwonchul-yoon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Kwonchul Yoon: Innovator in Clothing Treatment Technology

Introduction

Kwonchul Yoon is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of clothing treatment technology. His innovative approach has led to the development of a unique apparatus designed to enhance the care of garments.

Latest Patents

Kwonchul Yoon holds a patent for a clothing treatment apparatus. This apparatus includes a body with a receiving chamber for clothing, a door for access, a spraying member for steam application, and a steam generator. The design also features a discharge port for condensate water, ensuring efficient operation and maintenance.

Career Highlights

Yoon is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of technology in the clothing treatment sector. His work reflects a commitment to innovation and quality, contributing to the company's reputation as a leader in electronics and home appliances.

Collaborations

Some of Kwonchul Yoon's coworkers include Taegwang Kim and Heetae Lim. Their collaborative efforts within Samsung Electronics Co., Ltd. foster an environment of creativity and technological advancement.

Conclusion

Kwonchul Yoon's contributions to clothing treatment technology exemplify the spirit of innovation. His patent and ongoing work at Samsung Electronics Co., Ltd. highlight the importance of advancements in everyday technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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