Company Filing History:
Years Active: 2002-2005
Title: Innovations of Kwok Keung Paul Ho
Introduction
Kwok Keung Paul Ho is a notable inventor based in Singapore, recognized for his contributions to the field of semiconductor manufacturing. He holds a total of seven patents, showcasing his expertise and innovative spirit in technology.
Latest Patents
One of his latest patents is a plasma etch method for forming a plasma etched silicon layer. This method involves providing a first substrate with a silicon layer, which is then etched using a plasma etch method. The process employs a plasma reactor chamber and a specific plasma etchant gas composition that activates to produce active bromine and chlorine containing etchant species. The method includes several steps: seasoning a cleaned plasma reactor chamber to form a polymer layer, etching the first silicon layer within this seasoned chamber, and subsequently cleaning the polymer layer before etching a second silicon layer.
Career Highlights
Kwok Keung Paul Ho has made significant strides in his career, particularly at Chartered Semiconductor Manufacturing Ltd. His work has been pivotal in advancing semiconductor technologies, particularly in the area of plasma etching techniques.
Collaborations
He has collaborated with notable colleagues, including Simon Yew-Meng Chooi and Yi Liang Xu, contributing to various projects and innovations in the semiconductor field.
Conclusion
Kwok Keung Paul Ho's innovative work in plasma etching and semiconductor manufacturing has established him as a key figure in the industry. His patents reflect a commitment to advancing technology and improving manufacturing processes.