Suwon-si, South Korea

Kwang-Yul Lee


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Innovations in Semiconductor Fabrication by Kwang-Yul Lee

Introduction

Kwang-Yul Lee, a prominent inventor based in Suwon-si, South Korea, has made significant contributions to the field of semiconductor technology. With a patent in his name, he showcases innovative strategies that enhance the fabrication processes of semiconductor devices. As an employee of Samsung Electronics Co., Ltd., he is at the forefront of technology advancements in the industry.

Latest Patents

Kwang-Yul Lee holds a patent titled "Method for fabricating semiconductor device including replacement process of forming at least one metal gate structure." This advanced method involves several steps, including the formation of an inter-metal dielectric layer with trenches, the application of dielectric and conductive layers, and ultimately, the creation of metal gate structures. The detailed steps not only enhance the manufacturing process but also improve the performance of semiconductor devices significantly.

Career Highlights

Throughout his career at Samsung Electronics Co., Ltd., Kwang-Yul Lee has demonstrated exceptional skills and knowledge in semiconductor fabrication. His innovative approach has led to advancements that help streamline processes and improve efficiency, positioning him as an influential figure in his field.

Collaborations

Working alongside talented colleagues such as Ju-Youn Kim and Ji-hwan An, Kwang-Yul Lee has fostered a collaborative environment that encourages cutting-edge innovations in their projects. The synergy between these professionals has been instrumental in advancing their research and achieving significant milestones in semiconductor manufacturing.

Conclusion

Kwang-Yul Lee's contributions to semiconductor technology highlight the crucial role of inventors in evolving crucial industrial processes. His patent underscores the importance of innovative methods in enhancing device performance, demonstrating the impact of dedicated inventors like him in shaping the future of technology.

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