Kwang-wook Lee

Title: **Innovations of Kwang-wook Lee: Patents and Collaborations**

Introduction

Kwang-wook Lee is an accomplished inventor based in Anyang, South Korea, known for his significant contributions to semiconductor technology. With a total of four patents to his name, he has played a pivotal role in advancing methods and apparatuses used in the semiconductor manufacturing industry.

Latest Patents

Kwang-wook Lee's latest innovations include a method of removing oxide layers and a semiconductor manufacturing apparatus designed for this purpose. The method focuses on removal of natural oxide layers from silicon wafers, employing a vertically movable susceptor within a processing chamber. By creating a vacuum condition, hydrogen gas in a plasma state and fluorine-containing gas are introduced, leading to a chemical reaction that forms a reaction layer on the oxide. The susceptor then moves upward, allowing the silicon wafer to be annealed and effectively vaporizing the reaction layer, which is subsequently exhausted from the chamber. This innovative technique allows for high selectivity in oxide layer removal while preserving the integrity of the underlying layers.

Additionally, he has developed a cleaning solution specifically aimed at removing damaged portions of ferroelectric layers. This solution combines a fluoride, an organic acid with a carboxyl group, an alkaline pH adjusting agent, and water, offering a reliable cleaning method for delicate materials.

Career Highlights

Kwang-wook Lee is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work primarily involves enhancing semiconductor manufacturing processes through innovative solutions, positioning him as a key figure in the field of electronic materials.

Collaborations

Throughout his career, Kwang-wook Lee has collaborated with notable colleagues such as Kun-tack Lee and Im-Soo Park. These collaborations enhance the creative exchange of ideas and technical knowledge, fostering innovation within the team and contributing to the successful development of new technologies.

Conclusion

Kwang-wook Lee's contributions to semiconductor technology continue to make a significant impact, demonstrating his commitment to innovation in the field. His inventive methods for oxide layer removal and cleaning solutions reflect his deep understanding of the challenges faced in semiconductor manufacturing, helping to streamline processes and improve product quality.