Company Filing History:
Years Active: 1993
Title: **Innovator Kwang-Leei K. Young: Advancements in Semiconductor Manufacturing**
Introduction
Kwang-Leei K. Young is a notable inventor based in Palo Alto, California, recognized for his contributions to the semiconductor industry. His innovative approach to manufacturing integrated circuits has resulted in significant advancements, particularly in the area of contact hole etching and dielectric planarization. With one patent to his name, Young has made a remarkable impact on technology and engineering.
Latest Patents
Kwang-Leei K. Young's most significant patent focuses on "Simultaneous dielectric planarization and contact hole etching." This invention addresses the challenges faced during the manufacture of semiconductor integrated circuits by improving the process of forming contact holes through non-planar insulating layers. By utilizing a technique that combines sloped and vertical sidewall portions, this patent allows for the effective planarization of dielectric layers while exposing contacts with varying profile heights. This innovation not only reduces contact damage but also eliminates the need for an additional planarization step, streamlining the manufacturing process.
Career Highlights
Kwang-Leei K. Young has had a distinguished career at Hewlett-Packard Company, where his inventive spirit and technical expertise have contributed to numerous advancements in semiconductor technology. His work has been pivotal in enhancing the efficiency and reliability of semiconductor devices, making a lasting impact on the field.
Collaborations
Throughout his career, Young has collaborated with notable colleagues such as Warren M. Uesato and Hung-Kwei Hu. These partnerships have fostered a collaborative environment that has led to innovative breakthroughs in semiconductor manufacturing.
Conclusion
Kwang-Leei K. Young's contributions to the semiconductor industry exemplify the importance of innovation in technology. His patent on simultaneous dielectric planarization and contact hole etching reflects a deep understanding of manufacturing processes and their challenges. As technology continues to evolve, inventions like Young's will play a crucial role in shaping the future of semiconductor engineering.