Hong Kong, China

Kwan Yu Lo

This inventor holds 1 USPTO granted patent. Top assignee: The Hong Kong Polytechnic University. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kwan Yu Lo. Retrieved from https://idiyas.com/inventor/kwan-yu-lo-yu5rsme1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Kwan Yu Lo: Innovator in Antimicrobial 3D Printing

Introduction

Kwan Yu Lo is a prominent inventor based in Hong Kong, CN. He has made significant contributions to the field of 3D printing, particularly in the development of antimicrobial products. His innovative approach integrates antimicrobial agents into 3D-printed materials, enhancing their functionality and durability.

Latest Patents

Kwan Yu Lo holds a patent for a method of preparing antimicrobial 3D-printed material. This method involves integrating antimicrobial agents throughout the product, ensuring that the material exhibits antimicrobial effects and is resistant to daily wear and tear. His patent represents a significant advancement in the application of 3D printing technology for health and safety.

Career Highlights

Kwan Yu Lo is affiliated with The Hong Kong Polytechnic University, where he contributes to research and development in innovative technologies. His work focuses on enhancing the properties of 3D-printed materials, making them more effective for various applications.

Collaborations

Kwan Yu Lo collaborates with Chi Wai Kan, a fellow researcher, to further explore the potential of antimicrobial 3D printing technologies. Their partnership aims to push the boundaries of what is possible in this exciting field.

Conclusion

Kwan Yu Lo is a trailblazer in the realm of antimicrobial 3D printing, with a patent that showcases his innovative spirit and dedication to improving material safety. His contributions are paving the way for future advancements in this technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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