Kurt Fredrickson

Title: Innovations of Kurt Fredrickson in Selective Atomic Layer Deposition

Introduction

Kurt Fredrickson is a notable inventor based in Sunnyvale, California. He has made significant contributions to the field of materials science, particularly in the area of selective atomic layer deposition. With a total of four patents to his name, Fredrickson's work has advanced the techniques used in semiconductor manufacturing.

Latest Patents

Fredrickson's latest patents include innovative methods for selective atomic layer deposition. One of his patents describes methods of depositing a film selectively onto a first substrate surface relative to a second substrate surface. This method involves exposing the substrate surfaces to a blocking compound to selectively form a blocking layer on at least a portion of the first surface over the second surface. The substrate is then sequentially exposed to a metal precursor with a kinetic diameter exceeding 21 angstroms and a reactant to selectively form a metal-containing layer on the second surface over the blocking layer or the first surface. The relatively larger metal precursors allow for the use of blocking layers with gaps or voids without losing selectivity. Another patent focuses on methods and precursors for selectively depositing a metal film on a silicon nitride surface relative to a silicon oxide surface. In this method, the substrate comprising both surfaces is exposed to a blocking compound to selectively block the silicon oxide surface, allowing for the selective deposition of a metal film on the silicon nitride surface.

Career Highlights

Kurt Fredrickson is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has positioned him as a key player in the development of advanced deposition techniques that are crucial for modern electronics.

Collaborations

Fredrickson has collaborated with several talented individuals in his field, including Atashi Basu and Mihaela A Balseanu. These collaborations have further enriched his research and development efforts, leading to innovative solutions in atomic layer deposition.

Conclusion

Kurt Fredrickson's contributions to selective atomic layer deposition have significantly impacted the semiconductor industry. His innovative methods and collaborative efforts continue to drive advancements in materials science.