This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2025.
Company Filing History:
Years Active: 2025
Title: Kurt Decker-Lucke: Innovator in Hardmask Technology
Introduction
Kurt Decker-Lucke is a notable inventor based in Santa Clara, California. He has made significant contributions to the field of semiconductor manufacturing, particularly in the development of hardmask technologies. His innovative approach has led to advancements that enhance the performance and durability of hardmasks used in various applications.
Latest Patents
Kurt holds a patent for a method titled "Forming a doped hardmask." This patent describes techniques for depositing a hardmask with ions implanted at different tilt angles. By performing ion implantation to dope an amorphous carbon hardmask at multiple tilt angles, an evenly distributed dopant profile can be created. The implant tilt angle determines a dopant profile that enhances the hardness of the carbon hardmask.
Career Highlights
Kurt Decker-Lucke is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work focuses on improving the manufacturing processes and materials used in the production of semiconductors. His expertise in hardmask technology has positioned him as a valuable asset to his team and the industry.
Collaborations
Kurt collaborates with talented professionals such as Scott Falk and Rajesh Prasad. Together, they work on innovative projects that push the boundaries of semiconductor technology and improve manufacturing efficiency.
Conclusion
Kurt Decker-Lucke's contributions to hardmask technology exemplify the spirit of innovation in the semiconductor industry. His patent and collaborative efforts continue to influence advancements in manufacturing processes.