Company Filing History:
Years Active: 2008
Title: Kuo-Lung Wu: Innovator in Anti-Ultraviolet Technology
Introduction
Kuo-Lung Wu is a notable inventor based in Tainan County, Taiwan. He has made significant contributions to the field of light technology, particularly with his innovative approach to anti-ultraviolet reflectors. His work focuses on enhancing the durability and performance of materials exposed to UV radiation.
Latest Patents
Kuo-Lung Wu holds a patent for an anti-ultraviolet reflector. This invention is designed to distribute light from a point light source or a linear light uniformly over a target. The anti-UV reflector consists of a light-reflecting polymeric substrate and a protective layer made of anti-UV material. This layer is crucial for reducing yellowing in the polycarbonate substrate, which can occur due to prolonged exposure to UV radiation. When light illuminates the anti-UV reflector, the protective layer effectively filters or absorbs UV radiation, thereby preserving the integrity of the polycarbonate substrate.
Career Highlights
Kuo-Lung Wu is associated with Chi Lin Technology Co., Ltd., where he applies his expertise in developing advanced light technologies. His innovative solutions have the potential to impact various industries that rely on effective light management and UV protection.
Collaborations
Kuo-Lung Wu collaborates with talented individuals such as Hsi-Hsin Shih and Tien-Chieh Chang. Their combined efforts contribute to the advancement of technology in their field.
Conclusion
Kuo-Lung Wu's contributions to anti-ultraviolet technology exemplify the importance of innovation in protecting materials from UV damage. His patent reflects a significant step forward in enhancing the performance and longevity of light-reflecting materials.