The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 02, 2008

Filed:

Aug. 11, 2006
Applicants:

Hsi-hsin Shih, Taichung, TW;

Kuo-lung Wu, Tainan County, TW;

Tien-chieh Chang, Tainan County, TW;

Shih-kai Cheng, Tainan County, TW;

Mao-song Lee, Tainan County, TW;

Inventors:

Hsi-Hsin Shih, Taichung, TW;

Kuo-Lung Wu, Tainan County, TW;

Tien-Chieh Chang, Tainan County, TW;

Shih-Kai Cheng, Tainan County, TW;

Mao-Song Lee, Tainan County, TW;

Assignee:

Chi Lin Technology Co., Ltd., Tainan County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 27/36 (2006.01); B32B 9/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed is an anti-UV reflector for distributing a light from a point light source or a linear light uniformly over a target. The anti-UV reflector mainly includes a light reflecting polymeric substrate and a protecting layer of anti-UV material provided on the polycarbonate substrate for reducing yellowing in the polycarbonate substrate. When a light from a point light source or a linear light illuminates the anti-UV reflector, UV radiation in the light is filtered or absorbed by the protecting layer thereby reducing yellowing in the polyearbonate substrate.


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