Kuo-Lun Tseng

Title: Kuo-Lun Tseng: Innovator in Semiconductor Technology

Introduction

Kuo-Lun Tseng is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods for enhancing device performance.

Latest Patents

Kuo-Lun Tseng holds a patent for a "Method of forming a tungsten-plug contact for a semiconductor device." This patent describes a method for forming a tungsten plug, which involves selectively forming a TiSi.sub.2 layer in a contact hole using chemical vapor deposition. Following this, a TiN layer is created on the surface of the contact hole and the TiSi.sub.2 layer. A tungsten layer is then deposited on the TiN layer and within the contact hole. The process is completed with a chemical mechanical polishing (CMP) step to remove excess tungsten and TiN layers for planarization. This innovative approach is crucial for improving the efficiency and reliability of semiconductor devices.

Career Highlights

Kuo-Lun Tseng is associated with Mosel Vitelic Corporation, where he has been instrumental in advancing semiconductor technologies. His work has not only contributed to the company's success but has also had a lasting impact on the industry.

Collaborations

Throughout his career, Kuo-Lun Tseng has collaborated with talented individuals such as Hsi-Chieh Chen and Guan-Jiun Yi. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Kuo-Lun Tseng's contributions to semiconductor technology through his patent and work at Mosel Vitelic Corporation highlight his role as a key innovator in the field. His methods for forming tungsten-plug contacts are a testament to his expertise and dedication to advancing technology.