Company Filing History:
Years Active: 2002
Title: Kuo-Hua Ho: Innovator in Semiconductor Technology
Introduction
Kuo-Hua Ho is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in methods that enhance the performance of semiconductor wafers. His innovative approach has led to the development of a patented method aimed at reducing leakage current in semiconductor devices.
Latest Patents
Kuo-Hua Ho holds a patent for a "Method of reducing leakage current of a semiconductor wafer." This invention involves a semiconductor wafer that includes a silicon substrate, an active area positioned on the silicon substrate, and a field oxide layer surrounding the active area. The method forms a doped area in the silicon substrate and within the active area, followed by the deposition of a dielectric layer on the wafer's surface. A dry etching process is then performed to remove the dielectric layer, with the top power of the dry etching process ranging between three hundred and five hundred watts. This careful control prevents damage to the silicon substrate and reduces leakage current. Additionally, a wet etching process is utilized to further enhance the effectiveness of the method.
Career Highlights
Kuo-Hua Ho is associated with United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to focus on innovative solutions that address critical challenges in semiconductor manufacturing. His expertise and dedication have contributed to advancements in the field.
Collaborations
Kuo-Hua Ho has collaborated with notable colleagues, including Yuan-Li Tsai and Kai-Jen Ko. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Kuo-Hua Ho's contributions to semiconductor technology, particularly through his patented methods, highlight his role as an influential inventor in the industry. His work continues to impact the performance and efficiency of semiconductor devices, showcasing the importance of innovation in technology.