Kuo Hsiung Chen

Title: Kuo Hsiung Chen: Innovator in Semiconductor Manufacturing

Introduction

Kuo Hsiung Chen is a notable inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, showcasing his expertise through innovative patent developments. His work is particularly recognized for its impact on the efficiency and effectiveness of semiconductor structures.

Latest Patents

Kuo Hsiung Chen holds a patent for a manufacturing method of a semiconductor structure. This patent outlines a comprehensive process that includes several key steps. Initially, a substrate is provided, followed by the formation of a first dielectric layer on the substrate. A first conductive layer is then created within this dielectric layer. Subsequently, a capping layer made of nitride is formed over both the first dielectric and conductive layers. A diffusion barrier layer, composed of silicon-rich oxide (SRO), is applied over the capping layer. The process continues with the formation of a second dielectric layer on the diffusion barrier layer, where an opening is created to expose the diffusion barrier layer. A patterned photoresist layer is then formed on the second dielectric layer, allowing for a patterning process that expands the opening and exposes the first conductive layer.

Career Highlights

Kuo Hsiung Chen is currently employed at Powerchip Semiconductor Manufacturing Corporation, where he applies his innovative skills to advance semiconductor technologies. His work has been instrumental in enhancing manufacturing processes within the company, contributing to its reputation as a leader in the semiconductor industry.

Collaborations

Kuo Hsiung Chen has collaborated with several talented individuals in his field, including Ya-Ting Chen and Chun-Ta Chen. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Kuo Hsiung Chen is a distinguished inventor whose contributions to semiconductor manufacturing are noteworthy. His patent for a manufacturing method of semiconductor structures exemplifies his commitment to innovation in the industry. Through his work at Powerchip Semiconductor Manufacturing Corporation, he continues to influence the future of semiconductor technology.