Kuo-Chin Lin

Title: Innovations by Inventor Kuo-Chin Lin

Introduction: Kuo-Chin Lin is a notable inventor based in Tainan, Taiwan, recognized for his significant contributions to semiconductor manufacturing. With two patents to his name, Lin has made strides in the field of photo masking processes and chemical solution substrate processing.

Latest Patents: Lin's most recent patents include a novel method for manufacturing phase shift photo masks. In this invention, a resist layer is formed over a mask blank that incorporates a mask substrate, a phase shift layer, and a light blocking layer. The method highlights the process used to pattern the light blocking and phase shift layers through lithographic operations and etching masks, ensuring precision in photo mask production.

Additionally, he holds a patent for a method and system for processing substrates using chemical solutions in semiconductor manufacturing fabrication. This method encompasses supplying a chemical solution into a processing chamber and utilizing thermal imaging for analysis. It allows for optimal substrate processing based on real-time evaluations, enhancing the efficiency of semiconductor production.

Career Highlights: Kuo-Chin Lin is affiliated with Taiwan Semiconductor Manufacturing Company Ltd., a leading entity in the semiconductor industry. His work has been pivotal in advancing manufacturing techniques that are crucial for modern electronic components.

Collaborations: Throughout his career, Lin has had the privilege of collaborating with esteemed colleagues, including Hao-Ming Chang and Cheng-Ming Lin. Their combined expertise contributes to the innovative environment in which they operate, fostering advancements in semiconductor technology.

Conclusion: Kuo-Chin Lin exemplifies the spirit of innovation in the semiconductor manufacturing sector. His patents not only underscore his inventive talent but also serve to propel the industry forward. His contributions will certainly have a lasting impact on future technologies.